| 摘要 |
PURPOSE:To perform the procedures such as development, far ultraviolet ray irradiation and baking process automatically by a method wherein a developing part developing photoresist film, a far ultraviolet ray irradiating part irradiating the photoresist film with far ultraviolet rays and a baking part baking the photoresist film are provided. CONSTITUTION:A movable cover 18 covering the periphery and lower part of a specimen table 15 is provided while a developer jetting nozzle 20 spraying wafer 6 on the spinner table 15 with developer such as organic alkali solution etc. as well as a cleanser jetting nozzle 21 spraying the wafer 6 with cleanser such as pure water etc. are provided in a development part 2. The wafer 6 loaded on a belt conveyer 22 is successively shifted to a far ultraviolet ray irradiating part 3, a baking part 4 and an unloader 5 to be irradiated with far ultraviolet ray at the part 3 for a few minutes. Besides, a heater 28 is provided on the ceiling in the furnace body 24 of baking part 4 to bake a positive type resist film on the surface of wafer 6 being shifted by the belt conveyer 22. |
