| 摘要 |
1,262,060. Electroless deposition of Ni. RCA CORPORATION. Feb. 5, 1969 [Feb. 20, 1968], No. 39372/71. Divided out of 1, 260, 390. Heading C7F. Ni is electrolessly deposited from an alkaline aqueous solution of a Ni salt, sodium pynophosphate Na 4 P 2 O 7 À10H 2 O and sodium hypophosphite NaH 2 PO 2 ÀH 2 O having a molar concentration ratio Ni<SP>++</SP> /(H 2 PO 2 )<SP>-</SP> >0À26 and a temperature such that a constant rate of deposition is obtained independent of the Ni<SP>++</SP> concentration so long as the specified ratio is maintained. The bath temperature is about 25‹C. and the initial pH is 10À5. The specific plating bath contains 25g/l NaH 2 PO 2 À10H 2 O, 50g/l Na 4 P 2 O 7 À 10H 2 O, NH 4 OH to give a pH of 10À5 and variable amounts of NiSO 4 À6H 2 O as shown in the graph. A sensitized Al 2 O 3 substrate may be coated. |
