发明名称 METHOD AND APPARATUS FOR GUNNING MONOLITHIC REFRACTORY
摘要 PURPOSE:To enhance the mixing effect with a stock material and to eliminate the unnecessary use of a material, by setting the water jet orifice of a wafer ring to a fine diameter so that ultra-high pressure water sent under pressure is jetted fanwise in a mist form. CONSTITUTION:When water with ultra-high pressure of 30-50kg/cm<2> is sent under pressure from a water pump, said water is jetted fanwise into an inner pipe 4 in a mist form from a water jet orifice 3 provided so as to be directed to the diameter direction of the inner pipe 4 to form a water curtain C. When a refractory stock material A is sent under pressure of 2-4kg/cm<2> from a gun in this state, because the flow speed of the water curtain C is far higher than the flow speed of the stock material A, the curtain is only slightly carried away by the stock material A and mist like water is allowed to spread to the central part of the pipe 4 and the stock material A is stirred and mixed by the pressure of air sent under pressure. Because the water pressure applied to the water jet orifice 3 is extremely high, a jet orifice piece 30 is made of an abrasion resistant material.
申请公布号 JPS62129166(A) 申请公布日期 1987.06.11
申请号 JP19850268824 申请日期 1985.11.28
申请人 KAWASAKI REFRACT CO LTD 发明人 TORII HIRONOBU;WATANABE TADAAKI;OOTA KOICHI;MAEHARA SHINICHI
分类号 B05D7/00;B05B7/14;B05D1/02 主分类号 B05D7/00
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