| 摘要 |
PURPOSE:To form a protective thin-film easily, and to remove the shaped thin- film easily and completely by water or an organic solvent by making polyethyl oxazoline contain as a main constituent for protecting a semiconductor wafer. CONSTITUTION:20wt.pt. polyethyl oxazoline and 80wt.pt. methanol are introduced to a sealed vessel, and agitated and dissolved, thus manufacturing a methanol solution of polyethyl oxazoline. The solution is applied onto the surface of a semiconductor wafer by using a spinner and dried. A protective film is approximately 30mum thick. The protective film can be removed completely when it is washed through the wafer shower (the quantity of water at 5l/min) of ion exchanging water. Since the composition has excellent solubility to each of water and an organic solvent, it is effective when preparing a protective liquid or when dissolving and removing the protective film.
|
