| 摘要 |
PURPOSE:To obtain a heat-resistant photosensitive composition high in photosensitivity even in the case of using a thick film by incorporating a polymer having specified repeating units, a specified oxim compound, and a specified aromatic secondary or tertiary amine compound. CONSTITUTION:The photosensitive composition contains one of the polymers having repeating units represented by formula (I), the oxim compound represented by formula (II), and the aromatic secondary or tertiary amine com pound having said amino group directly combined to the aromatic ring but having not a keteone group represented by formula (III) directly linked to said ring. In formulae (I) and (II), X is a (2+n)-valent cyclic carbon group or the like; Y is a (2+m)-valent cyclic carbon group or the like; Z is a group represented by formula (IV); R* is a group having a C=C bond; W is a group capable of reacting with the carbonyl group by heat treatment and forming a ring; n is 1 or 2; m is 0, 1, or 2; COOR* and Z are located in an ortho or peri position to each other: R1 is H or the like; R2 is 1-8C alkyl or the like; and R3 is 1-6C alkyl or the like. |
