| 摘要 |
PURPOSE:To uniformly execute the removal of the foreign substances adhered on the surfaces of wafers regardless of the positions of the wafers by uniformly directing pure water to each wafer in a carrier through a plurality of pieces of the outflow ports perforated in the pipe. CONSTITUTION:The interior of a cleaning tank 1 is previously filled with pure water through a piping 2, a pipe 6 and outflow ports 6a and the pure water is overflowing through the upper end of the tank 1. In this state, a carrier 4 wherein wafers 3 are being arranged is dipped and the carrier 4 is transferred onto a carrier supporting stand 5. Then, the quantity of water from the outflow ports 6a is increased and water currents to direct to each wafer 3 are generated. Therefore, the foreign substances adhered on the surface of each wafer 3 are removed by the water current, are each made to float upward, overflows the upper end of the cleaning tank 1 for evacuation.
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