| 摘要 |
PURPOSE:To improve storage stability and to facilitate balancing of photosensitivity with dyability by forming a composition consisting of a polymer composed essentially of specified structural units, at lest one of specified compound, a sensitizer, and a photopolymerization initiator. CONSTITUTION:The photosensitive resin composition contains the polymer composed essentially of the structural units represented by formula [I] (R<1> is H, CH3, or C2H5; X is -O- or -NH-; n is 1, 2, or 3; and R<2> or R<3> is 1-4C alkyl), at least one of the compounds represented by formula [II] (R<4> is a group having one ethylenically unsaturated bond, and each of R<5> and R<6> is dependently H, CH3 or C2H5), the sensitizer, and the photoplymerization initiator. The polymer is composed of said units of formula [I], preferably, in an amount of >=20wt% of the polymer, and said compound needs to be contained in an amount of >=10wt%, preferably, >=20wt% of said polymer. AS the sensitizer, 5- nitroacenaphthene, Michler's ketone, and the like are preferably used. As the photopolymerization initiator, benzoyn ethyl ether, or the like benzoyn alkyl ethers, 2,2-diethoxyacetophenone, benzophenone, and the like are preferably used. |
