| 摘要 |
PURPOSE:To obtain the photomask capable of smoothing a pattern end such as a guide truck formed to the mask by providing with a film which does not pass an ultra-violet ray on a mask substance and by forming a reflecting film on a said film. CONSTITUTION:The film 2 which does not pass the ultra-violet ray is provided on the mask substrate 1, and the reflecting film 3 is formed on the surface of said film. A conventional glass and an acrylic resin, etc., are used to the substrate of the mask. The film 2 which does not pass the ultra-violet ray comprises a Cr or Ta film. The film 2 is formed conventionally by a sputtering or a vacuum depositing methods, etc. The reflecting film 3 is preferably composed of the conductive film contg. the mono-layer or the plural layer and is formed by the vacuum-depositing method or the sputtering method. Thus, when recording the guide truck, the Ar laser ray is not absorbed to a Cr film. Accordingly, as the resist film is not destroyed due to the increasement of the temperature of the Cr film, the end surface of the guide truck makes it possible to be smooth. |
