发明名称 PLASMA DEPOSITION PROCESS
摘要 <p>Dense layers of metals and compounds may be formed on a receiving surface of simple geometry by use of a plasma spray technique in a vacuum chamber in which multiple guns are used simultaneously to deposit material in overlapping areas.</p>
申请公布号 GB8710285(D0) 申请公布日期 1987.06.03
申请号 GB19870010285 申请日期 1987.04.30
申请人 GENERAL ELECTRIC CO 发明人
分类号 C23C4/06;C23C4/12 主分类号 C23C4/06
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