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发明名称
PLASMA DEPOSITION PROCESS
摘要
<p>Dense layers of metals and compounds may be formed on a receiving surface of simple geometry by use of a plasma spray technique in a vacuum chamber in which multiple guns are used simultaneously to deposit material in overlapping areas.</p>
申请公布号
GB8710285(D0)
申请公布日期
1987.06.03
申请号
GB19870010285
申请日期
1987.04.30
申请人
GENERAL ELECTRIC CO
发明人
分类号
C23C4/06;C23C4/12
主分类号
C23C4/06
代理机构
代理人
主权项
地址
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