发明名称 APPARATUS FOR MANUFACTURING THIN FILM
摘要 PURPOSE:To assure the strength of a magnetic field as well as to generate a magnetic field having excellent parallelism by applying a magnetic field to the substrates through the correction plates composed of a magnetic material. CONSTITUTION:A magnetic field of several tens of gausses is applied to three substrates 2 by opposed air-core coils 1, 1', and this magnetic field is improved in parallelism of the directions of the magnetic lines of force by correction plates 3, 3', 3'', 3'''. The point of the improvement of the magnetic field parallelism is to utilize the fact that the magnetic lines of force enters a magnetic material substantially vertically of the surface of the magnetic material, and the end faces of the correction plates opposed to the substrates are vertical to the desired direction of the magnetic field. By the fact that sputter particles emitted from a sputter target 4 in this magnetic field are deposited on the substrates 2, one-axis anisotropy of the magnetic material grown into a film, or fluctuation of the direction of the easy magnetizing axis is reduced, obtaining a film of good quality.
申请公布号 JPS62122208(A) 申请公布日期 1987.06.03
申请号 JP19850261181 申请日期 1985.11.22
申请人 HITACHI LTD 发明人 OSHITA YOICHI;NAKAGAWA YUKIO;SETOYAMA HIDETSUGU;KOBAYASHI TETSUO
分类号 H01F41/14;C23C14/35;C23C14/36 主分类号 H01F41/14
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