| 摘要 |
PURPOSE:To obtain a sufficient sensitivity even if a cantilever is made thin and also a weight is made small, by forming the cantilever by a multilayer film having an alkali etching resistance. CONSTITUTION:A cantilever 14 is formed by a multilayer film having an alkali etching resistance on the surface of an Si single crystal substrate 11. For instance, a triple layer film is formed by placing a nitride film (Si3N4) 141 and 142 on the upper and the lower sides of a polysilicon film 143. Also, a strain detector is constituted of a piezo-resistance 13 which is formed in the vicinity of a supporting part of the cantilever 14. Since the cantilever 14 is formed by a laminated film, its thickness accuracy can be set exactly irrespective of the accuracy of the substrate 11. Accordingly, a cantilever whose thickness is extremely thin can be realized, and even if an Si weight is made light, a sufficient sensitivity can be obtained.
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