发明名称 SURFACE DEFECT INSPECTION DEVICE
摘要 PURPOSE:To discriminate correctly the particle size of a stuck foreign matter, without depending on a substrate base material, by measuring a reflected light intensity of the substrate base material, and using this light intensity for the correction of a calculation of the particle size, in a light scattering type surface defect inspection device. CONSTITUTION:The extinction plate 7 of a laser light and a mirror 8 are provided on a reflected light intensity measuring base 9, and the laser light is irradiated to a standard Si surface 2 as shown in a figure (a). Its reflection intensity I0 is measured by a photoelectric multiplier 5. Also, with regard to a sample 2, the reflection intensity is measured in the same way, and a reflection intensity ratio I0/I1=(i) is derived. Subsequently, as shown in a figure (b), the reflected light intensity measuring base 9 is moved and detached from a laser optical path, and a foreign matter inspection is executed by scanning the surface of the sample 2. A scattered light intensity V1 from this foreign matter particle is detected, and a value iV1 which has multiplied this scattered light intensity V1 by the reflection intensity ratio (i) is brought to a data processing as a scattered light signal. Accordingly, since the scattered light intensity V1 is corrected by the reflection intensity ratio (i), the adhering particle size can be discriminated correctly irrespective of a substrate base material and a film thickness.
申请公布号 JPS62121339(A) 申请公布日期 1987.06.02
申请号 JP19850261092 申请日期 1985.11.22
申请人 HITACHI LTD 发明人 TAMURA HIROSHI;SAIKI ATSUSHI;SUZUKI MICHIO;HAYASHIDA TETSUYA
分类号 G01N21/88;G01N21/94;G01N21/956;H01L21/66 主分类号 G01N21/88
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