SPUTTERING DEVICE FOR FORMATION OF MAGNETIC THIN FILM

摘要

PURPOSE:To enable the uniform magnetic characteristics of a magnetic film by forming the magnetic film of which the film ratio of inclined planes and flat parts is 0.75 or more on a substrate having a plurality of high step parts and flat parts by determining the angle made by the substrate surface with the line connecting an erosion area of a target and the edge of the substrate which is nearest to said area 55 deg. or under. CONSTITUTION:An upper magnetic film 5 is formed on the magnetic core for a thin film magnetic head in which a lower magnetic member 2, a conductive coil 3, and an insulator 4 are arranged on a substrate 1. At the same time, a magnetic film 5 is formed on the substrate on which hundreds of such elements are formed. A magnetron magnet 7 is put under a target 6 and the substrate 1 is arranged oppositely to an erosion area 8 of the target. The angle thetamade by the substrate surface with the line connecting said erosion area 8 and the edge of the substrate 1 which is nearest the area 8 is determined as theta<=55, thereby obtaining the magnetic film 5 whose step coverage b/a is at least 0.75 on the substrate 1 having a plurality of high step parts and flat parts.