| 摘要 |
PURPOSE:To obtain an X-ray exposing apparatus which is set to a fine level lower than a vibration elimination by separating a mask, a wafer to be eliminated for vibration and a rotary target, a motor and a pump and constructing to maintain a vibration eliminating base of the wafer, mask and a vibration elimination base of a beam source at a predetermined distance so that an X-ray range can follow the vibration of the base after the movable base is moved, thereby minimizing the X-ray range as required. CONSTITUTION:A mask 20, a wafer 21 and a movable base 22 are mounted on a vibration eliminating base 23 supported by legs 25a to a floor 26, a vibration eliminating base 28 supported by legs 25b to the floor 25 is composed of angles surrounding the base 23, beams 29a, 29b, 29c are stood on the base 28, a rotary target 12, a motor 13 for rotating the target and a pump 15 are mounted. A length measuring unit 31a is moved at a distance in X direction to the base 23, and a length measuring unit 31b is moved at a distance in Y direction in a predetermined accuracy by a non-contacting length measuring unit to move the base 29 by drivers 30a, 30b mounted on the legs 25b.
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