| 摘要 |
PURPOSE:To improve mold releasability, to eliminate the deterioration of patterns by transfer, and to repeatedly carry out 2p transfer by providing a film of a metal or the oxide, nitride, or carbide of the metal on a 2p stamper. CONSTITUTION:After a resist is coated on a glass substrate 1, a spiral grooved pattern having 1mum width is scanned (exposed) by laser light and developed to form a resist pattern 2. A 2p resin 3 is coated on the resist pattern 2, a glass substrate 4 is placed thereon through a spacer having 40mum thickness, and then UV rays are irradiated to cure the 2p resin layer 3. The cured 2p resin layer 3 is released from the glass substrate 1 along with the glass substrate 4. Since the resist pattern 2 is simultaneously released along with the 2p resin layer 3, the resist pattern 2 is removed from the 2p resin layer 3 with a solvent. Then chromium is deposited in vacuum in 10-30nm thickness on the surface of the 2p resin layer of the 2p stamper consisting of the 2p resin layer 3 and the glass substrate 4 to obtain the protective and release-promoting film 3, and the surface of the chromium film 3 is treated with oxygen plasma to enhance the releasability.
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