| 发明名称 |
PROCEDE DE FABRICATION D'UNE PELLICULE FINE MULTICOMPOSANT |
| 摘要 |
A multicomponent amorphous silicon film suitable for a solar cell is produced at a higher deposition rate by a novel process comprising using jointly a sputtering method and a plasma CVD method within a pressure range of not lower than a pressure at which the maximum film formation rate is given in the sputtering method. |
| 申请公布号 |
FR2543737(B1) |
申请公布日期 |
1987.05.29 |
| 申请号 |
FR19840005098 |
申请日期 |
1984.03.30 |
| 申请人 |
DIRECTOR GL AGENCY IND SCIENCE |
发明人 |
HITOTSUYANAGI HAJIME, FUJITA NOBUHIKO, ITOZAKI HIDEO ET KAWAI HIROMU |
| 分类号 |
H01J37/32;C23C14/00;C23C14/06;C23C14/14;C23C14/22;C23C14/34;C23C14/35;C23C14/36;C23C16/24;C23C16/50;C23C16/509;H01L21/203;H01L21/205;H01L29/16;(IPC1-7):H01L21/20;C23C15/00 |
主分类号 |
H01J37/32 |
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