| 摘要 |
PURPOSE:To improve the antistatic property of a photosensitive silver halide material as well as the abrasion resistance and to increase the suitability to an intensifying screen by incorporating a specified volume percentage or more of a matting agent of a specified particle size and a specified surfactant into the top layer of the photosensitive material. CONSTITUTION:A photosensitive material contg. a surfactant and >=40vol% matting agent of 4-30mum particle size in the top layer is manufactured. A superior antistatic property is provided to the photosensitive material. The surfactant is represented by formula I , II or III [where R1 is 1-30C (substituted) alkyl, alkenyl or aryl; A' is -O-, -S-, -COO- or a group represented by formula IV; R10 is (substituted) alkyl; each of R2, R3, R7 and R8 is H, (substituted) alkyl, aryl, alkoxy, halogen, acyl, amido, sulfonamido, carbamoyl or sulfamoyl; each of R6 and R8 is (substituted) alkyl, aryl, alkoxy, halogen, acyl, amido, sulfonamido, carbamoyl or sulfamoyl; each of R4 and R5 is H, (substituted) alkyl or aryl; R4 and R5, R6 and R7, and R8 and R9 may form each ring by bonding to each other; each of n1-n4 is 2-50; and m is 2-50]. |
