| 摘要 |
A deposited film (407) of a desired pattern is formed selectively on a deposition surface (406) comprising a plurality of different kinds of materials (406, 407) formed corresponding to said pattern. The different kinds of material provide different nucleus forming densities. Thus a third material (409) can be self selectively attached to one (407) of the different kinds of material (406, 407) without becoming attached to the other. <IMAGE> |
