| 摘要 |
PURPOSE:To simplify the constitution of a moving means for a sample, and to ensure a sealing function by arranging a sample base plate into a sample chamber and turning the sample to a first position oppositely faced to a plasma device and the second position of hermetic sealing faced to a hole communicated with a load locking chamber. CONSTITUTION:An etching chamber 3 is irradiated by plasma generated in a plasma producing chamber 1 for a plasma device from a leading-out port 1d for plasma. The chamber 3 is formed to a rectangular hollow shape, and an exhaust port 3a communicated with an exhaust system is shaped at the center of another side wall oppositely faced to the producing chamber 1. A communicating hole 3b is opened at the center of the upper section of the chamber 3, an O ring 3c is fitted to the periphery of the chamber 3 side, and a load locking chamber 5 is disposed detachably to the upper outer wall of the chamber 3. A base plate 7 on which a sample 6 is placed is arranged into the chamber 3, a shaft 7d is fixed to a substrate section 7a for the base plate 7, and the sample 6 is rotated to a first position oppositely faced to the plasma leading-out port 1d and a second position faced to the hole 3b communicated with the chamber 5 by a carriage section 7e, thus simplifying the constitution of a moving means for the sample 6.
|
