| 摘要 |
PURPOSE:To reduce an interference phenomenon by influence of a foundation of a pattern and to detect the pattern by providing mean to irradiate laser light with wavelength of >=2 kinds and changing the using wavelength. CONSTITUTION:The titled device is constituted of the irradiation means 1 and 2 of the laser light with the different wavelength, shutters 3a and 3b to select the laser light, a mirror 4 to change an optical path, etc. Then, a deviation of phase of each reflected light due to constitution and the film thickness of the foundation of the pattern 6 to be measured is reduced, namely, the interference phenomenon is reduced and the intensity of the light of synthetic waves, namely, the detected reflected waves can be maintained by changing the wavelength of the laser light to a proper value using the irradiation means 1 and 2 and an optical system to guide the means to the pattern 6 to be measured. In this way, even any pattern can be recognized. |
