发明名称 NON-SETTLING PHOTORESIST COMPOSITION
摘要 There is disclosed a photoresist composition comprising a light-sensitive, quinone diazide polymer, a binder and a benzene monomer trisubstituted with a diazo-naphthoquinone-sulfonyloxy group. The composition is improved in that the diazo-naphthoquinone-sulfonyloxy group occupies the 1,2,4-positions on the benzene ring, whereby improved solubility is achieved.
申请公布号 JPS62115441(A) 申请公布日期 1987.05.27
申请号 JP19860252090 申请日期 1986.10.24
申请人 EASTMAN KODAK CO 发明人 RUSHIAA BAABARA BORANDO
分类号 G03C1/72;C08K5/42;C08L61/04;C08L61/14;G03F7/022;G03F7/023;H01L21/027 主分类号 G03C1/72
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