Hard mask for photolithographic processes

摘要

The invention proposes the use of a photosensitive glass, which can be coloured black and optically dense in the body of the material, by means of an exposure process followed by heat treatment, for the production of hard masks for photolithographic processes, for example for the production of the etching pattern (template) of liquid crystal displays, for the production of etched shaped articles or for processes in semiconductor manufacture.