| 摘要 |
PURPOSE:To obtain an electrophotographic sensitive body having superior electrostatic chargeability, low residual potential, high sensitivity in a wide wavelength region and superior environmental resistance by forming a laminate consisting of amorphous silicon and microcrystalline silicon as a photoconductive layer. CONSTITUTION:A blocking layer 102 of P- or N-type muC-Si contg. H and at least one among C, O and N and a photoconductive layer 103 are laminated on an electrically conductive Al support 101. The photoconductive layer 103 is formed by laminating a muC-Si layer 104, the 1st a-Si layer 105 and the 2nd a-Si layer 106. The layer 106 contains at least one among C, O and N and at least one among C, O and N in the layer 106 forms an ununiform concn. distribution in the thickness direction so that the concn. is made higher on the support side. When light close to visible light is irradiated, the 1st a-Si layer 105 absorbs most of the light and the muC-Si layer 104 absorbs the remaining light unabsorbed in the layer 105. |
