| 摘要 |
There are disclosed negative-working resist compositions featuring a binder and a radiation-sensitive compound that loses HX upon exposure, to become less soluble in an aqueous base. X is selected from the group consisting of -CN, halide, and -SO2R1+L, and R1 is alkyl of 1-5 carbon atoms or aryl of from 6 to 10 carbon ring atoms.
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