| 摘要 |
PURPOSE:To prevent appearance of an inferior master mask by forming a master mask using a reticle with a chip name pattern within its scribed line and by referring the mask name pattern of the master mask to the chip name pattern of each chip. CONSTITUTION:Using primary reticle 7 having chip region 2 except wiring pattern regions 1, chip name pattern 4 and dummy region 5 within scribed line 3, and a light shielding layer in peripheral region 6, secondary reticle 8 whose pattern is the laternal inverse of the pattern of reticle 7 is formed. A negative resist is coated onto a blank sheet for a master mask with visible master name pattern 9 corresponding to a chip pattern to be used, and the chip pattern is exposed on the sheet by a step- and-repeat method using reticle 8. The exposed sheet is developed and etched to form master 10. Each pattern 4 and pattern 9 are then confirmed by reference. |
