| 发明名称 |
REMOVAL OF ORGANIC SUBSTANCE FROM ORGANIC FILM BY PATTERNIZING THE SAME |
| 摘要 |
A method is provided for removing organic material from an organic film in a patterned manner using ultraviolet light at sufficient power density to effect the patterned ablative photodecomposition of an organic film in the form of a blend of aliphatic and aromatic organic material or a copolymer of chemically combined aliphatic units and aromatic units. |
| 申请公布号 |
JPS62115153(A) |
申请公布日期 |
1987.05.26 |
| 申请号 |
JP19860206093 |
申请日期 |
1986.09.03 |
| 申请人 |
GENERAL ELECTRIC CO <GE> |
发明人 |
HAABAATO SUTANREI KOORU JIYUNIA;YUN SHIEN RIU;HAABAATO REINORUDO FUIRITSUPU |
| 分类号 |
H01L21/30;G03F7/038;G03F7/039;G03F7/30;G03F7/36;H01L21/027;H01L21/311;H01L21/48 |
主分类号 |
H01L21/30 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
