| 摘要 |
PURPOSE:To stabilize sputtering conditions with a uniform compsn. having a high density and to improve productivity by mixing titanium, etc., with selenium, bringing the same into reaction by heating in a vacuum or inert gaseous atmosphere, adding tellurium to the mixture and pulverizing the mixture then molding the powder under pressurization. CONSTITUTION:The sputtering target for optical recording is obtd. by mixing >=1 kinds of metals such as titanium and silver with a selenium alloy, bringing the mixture into reaction by heating in the vacuum or inert gaseous atmosphere, adding a tellurium alloy to the mixture, pulverizing and mixing the same in the nonoxidative atmosphere and subjecting the mixture to molding under pressurization then to cutting and finishing. These materials are mixed at ratios of 60-100% tellurium, <=30% selenium and <=20% >=1 kinds of metals such as titanium, silver, arsenic and lead. The uniform compsn. approximately equal to the theoretical density is thus obtd. by pulverizing and mixing. The inter- particle binding power is increased by the improvement of sinterability, by which the sputtering conditions are stabilized. The productivity is improved by the continuous sputtering.
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