| 摘要 |
PURPOSE:To make the discrimination of a product before and after change easy when manufacturing conditions are changed by using a mask which is removed of a different element pattern to avoid being patterned from the plural checking element patterns of an exposure mask for a partial process in each different conditions of the partial process. CONSTITUTION:A conventional element 1 for resistance checking has a boron impurity region 3 by the same boron diffusion process with an internal circuit. In the case of making a semiconductor device which has high boron concentration, a mask which has a pattern of forming no boron impurity region 3 is used for exposure in an element region 1 for checking. This forms no boron impurity region in an element for checking resistance after a boron diffusion process, the resistance of the element for checking resistance shows a large value of single crystal silicon which is an entirely different value from that of a conventional condition product and discrimination can be performed clearly. |
