发明名称 METHOD AND APPARATUS FOR MEASURING X RAY DIFFRACTION FOR THIN FILM LAYER
摘要 PURPOSE:To measure the condition of a superthin film layer, by a method wherein irradiation X rays is projected onto a sample at a low angle while a light receiving system is detected close to the sample and further, a part of an X ray path is made vacuum. CONSTITUTION:An incident side, light receiving side solar slit sections 20 and 26 are all in vacuum cylinders 28 and 30 but the portion of the sample 14. Then, irradiation X rays (A) passes through an incident side vacuum cylinder 28 containing incident solar slit 20 to reach a sample 14. To keep the penetration depth of X rays as shallow as possible, scanning is not performed in the direction of 2theta to the sample 14 and the incident angle alpha is fixed lower. Then, the X ray diffracted on the sample 14 passes light receiving side vacuum cylinder 30 containing a receiving solar slit 26 and a spectroscope 24 to reach the spectroscope 24. Here, the receiving solar slit 26, the spectroscope 24 and the detector 22 are brought close to the sample 14 as much as possible to increase the intensity.
申请公布号 JPS62113051(A) 申请公布日期 1987.05.23
申请号 JP19850254270 申请日期 1985.11.13
申请人 KAWASAKI STEEL CORP 发明人 KATAYAMA MICHIO;SHIMIZU MASATO
分类号 G01N23/207 主分类号 G01N23/207
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