| 摘要 |
PURPOSE:To measure a shape of a projecting shape pattern without staining and damaging a sample by placing a detector at the position at an elevation angle <=45 deg. from the sample surface having the projecting shape pattern and measuring the shape of the pattern and increasing the signal intensity. CONSTITUTION:After aluminum is vapor deposited on a silicon substrate 1, the aluminum is processed to the linear pattern with the projecting shape. Then, electron beams 3 are scanned on the aluminum pattern 2 on the silicon substrate 1 and reflected beams 5 are detected by the detector 4 which is placed so as to cover an elevation angle <=45 deg. from the sample surface and the output signal waveform is accumulated on a memory of a computer. In this way, the shape of the projecting shape pattern can be measured without staining and damaging the sample by regulating the relative position of the detector 4 with respect to the sample surface and increasing the signal intensity.
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