| 摘要 |
PURPOSE:To contrive reduction of an imperfect product due to a foreign matter by subjecting the inside of a vacuum tank to sandblast working and inhibiting the peeling of the foreign matter stuck to the inside and preventing dust generation during the operation such as ion milling. CONSTITUTION:In case of performing operation in the inside of a vacuum tank such as an ion milling apparatus and a sputtering apparatus, sandblast working is performed in the inside of the vacuum tank. Thereby, for example, even if a substance subjected to ion milling is sputtered on the inside wall of the vacuum tank, natural peeling is prevented because the surface is roughened. Therefore, dust generation during formation of a thin film and etching is prevented and an imperfect product due to a foreign matter is reduced.
|
