| 摘要 |
<p>A new cephem compound of the formula: …<CHEM>… wherein… R<1> is amino or protected amino,… R<2> is hydrogen, hydroxy protective group, lower alkyl,… dihalogenated lower alkyl, cyclo(lower)alkenyl, thietanyl, carboxy(lower)alkyl or protected carboxy(lower)alkyl,… R<3> is lower alkyl,… R<4> and R<5> are each hydrogen, lower alkyl, hydroxy (lower)alkyl, lower alkoxy, amino or protected amino,… R<6> is COO<(-)>, carboxy or protected carboxy,… X<(-)> an anion, and… n is 0 or 1, with certain provisions, processes for their preparation and pharmaceutical compositions containing them. The invention relates also to compounds of the formula …<CHEM>… and of the formula …<CHEM>… in which Z is an acid residue.</p> |
