| 摘要 |
PURPOSE:To obtain a planar circuit pattern which can be augmented and corrected, by forming a conductive pattern with organic polysilane. CONSTITUTION:A solid-state film 4 of organic polysilane is formed on a sub strate 2, and irradiated 5 with energy rays in a vacuum state to form bridge pattern 6. Thereafter, electron accepting material is doped, and an exposed circuit pattern part 7 is made conductive. Even if a current is made to flow through the exposed circuit pattern part, the current hardly flows through an unexposed part. An unexposed part 8 can be regarded as an insulator. Therefore, a flat electric circuit pattern can be simply formed. Since the unexposed organic polysilane is present between the patterns, the patterns can be augmented or corrected simply only by performing the exposure again, in the case the pattern size is smaller than the objective value, or in the case a new pattern is added.
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