| 摘要 |
PURPOSE:To remarkably improve the adhesion between a formed film and a substrate by grinding the surface of the substrate with polishing powder having mean particles diameter in the specified range as the pretreatment when a diamond film or a diamond like carbon film is formed on the substrate. CONSTITUTION:When the diamond film or the diamond like carbon film is formed on the substrate, the surface of the substrate is ground with the polishing powder having 1-15mum mean particle diameter, and the diamond film or the diamond like carbon film is formed on the substrate. The mean particle diameter of the polishing powder is most preferably adjusted to 2-10mum. The diamond film or the diamond like carbon film can be formed on the substrate by vacuum deposition, chemical vapor growth, plasma chemical vapor growth, or an ion- beam method.
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