| 摘要 |
PURPOSE:To obtain metal electrodes of a predetermined pattern without allowing the residue of photoresist to remain by using Ti as an ion milling mask. CONSTITUTION:A Ti mask 11 is formed in a predetermined pattern by photolithography and chemical etching, and its thickness is 3,000Angstrom . An electrode metal 12 is removed by ion milling in this state, and the mask 11 is thereafter removed by chemical etching to form the metal 12 in a predetermined pattern.
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