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发明名称
Verfahren zur galvanischen Abscheidung haftfester Schichten von Platinmetallen auf Sintermetallen,insbesondere Tantal
摘要
申请公布号
DE1621174(A1)
申请公布日期
1971.04.29
申请号
DE19671621174
申请日期
1967.10.27
申请人
SIEMENS AG
发明人
ECKERT,GEORG,DR.;DUERR,LEO,DIPL.-CHEM.
分类号
C25D3/28
主分类号
C25D3/28
代理机构
代理人
主权项
地址
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