发明名称 MANUFACTURE OF POLYCRYSTALLINE SILICON SEMICONDUCTOR AND CASTING MOLD
摘要 PURPOSE:To improve an ingot yield by filling melted silicon in a separable graphite cast molds in which a mixture of one or more of oxide, nitride and carbide of silicon is coated on the inner surface, cooling to solidify the liquid, and then dividing the molds to remove the ingot. CONSTITUTION:Sections of molds are formed of four side walls 1, and one bottom plate, totally 5 divided plates, and assembled with screws 2. Powder which mainly contains silicon nitride is coated on the inner wall surface 3 of associated cast molds. After an ingot is cooled to room temperature, the screws 2 are removed to divide the molds, and the ingot is removed. After the ingot is removed, the molds are again associated, powder is coated on the inner wall surface, and the molds are repeatedly used. Thus, the yield of ingot utilizing portion is improved, and the cost of a polycrystalline silicon semiconductor is reduced.
申请公布号 JPS62108515(A) 申请公布日期 1987.05.19
申请号 JP19850249801 申请日期 1985.11.06
申请人 OSAKA TITANIUM SEIZO KK 发明人 KANEKO KYOJIRO;MIZUMOTO HIDEYUKI
分类号 H01L31/04;C01B33/02;H01L21/18;H01L21/208 主分类号 H01L31/04
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