发明名称 HIGH-FREQUENCY GROUNDING AND SELF-BIASSING METHOD OF FET FOR HIGH FREQUENCY
摘要 PURPOSE:To decrease part constituting materials, to improve yield on assembly and to reduce cost by fixing an FET for high frequency onto a circuit substrate while fastening a capacitor onto a through-hole and connecting an upper electrode for the capacitor with a ground electrode for the FET for high frequency. CONSTITUTION:An insulating substrate 3 with conductor film circuits 2 is fixed onto a grounding conductor 1 and conductor films 10 are formed onto the inner surfaces of through-holes 9 bored into said substrate, and the grounding conductor 1 and the upper surface of a circuit substrate are connected. Capacitors 5 are fastened onto the through-holes 9, and upper-surface electrodes 6 for the capacitors 5 and ground electrodes 7 for a FET4 for high frequency fixed onto the same insulating substrate 3 are connected by wires 8, thus taking high-frequency grounding between the FET4 and the grounding conductor 1. Self-bias circuits are shaped through the capacitors 5 and the FET4 for high frequency is biassed. Accordingly, the decrease of part constituting materials, the improvement of yield on assembly and the reduction of cost can be attained.
申请公布号 JPS62108577(A) 申请公布日期 1987.05.19
申请号 JP19850249456 申请日期 1985.11.06
申请人 NEC CORP 发明人 WATANABE KENJI
分类号 H01L29/812;H01L21/338;H01L23/12;H01L25/00;H01L29/80 主分类号 H01L29/812
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