| 摘要 |
PURPOSE:To provide a photosensitive compsn. having high sensitivity to ultraviolet rays by incorporating a sensitizer combining a Si-contg. material prepd. by (co)polymerizing with a specified substituted acetylenic compd., with a quinone compd. or a nitro compd., and a surface active agent. CONSTITUTION:The compsn. contains a sensitizer combining a Si-contg. material obtd. by (co)polymerizing with a substituted acetylenic compd. expressed by the formula I (where R1 is silyl or substituted silyl group; R2 is one selected from H, alkyl group, aromatic group, substituted aromatic group silyl group, substituted silyl group), with a quinone compd. or a nitro compd., and a surface active agent. A photoresist made of the compsn. has positive characteristics for ultraviolet rays. Since it is usable in the form of thin film, the resolving power of the photoresist is high. Moreover, since the sensitizer is dispersed uniformly by the effect of the surface active agent, the sensitivity for ultraviolet rays is high, so a pattern can be exposed in a very short time on a large base plate, as well as on a small base plate. |
