| 摘要 |
PURPOSE:To accurately and stably monitor temp. of a base plate while subjecting it to film-forming treatment by using a temp. detector having same material as a base plate to be treated and connecting both a temp. measuring element and a temp. measuring circuit to the temp. detector. CONSTITUTION:A base plate 3 to be treated is heated by kinetic energy of a sputtering grain and infrared-ray emitted from a sputtering source 2 while the film-forming treatment. A temp. detector 4 positioned to the neighborhood of the base plate 3 is similarly heated. This temp. detector 4 is made to same material as the plate 3 to be treated and transmittance of infrared-rays and specific heat are same as those of the plate 3 to be treated. Therefor when incident heat density and thickness of temp.-detecting base material are same, amount of elevation of temp. of the base plate 3 and the temp. detector 4 is made same. The temp. of the base plate 3 can be accurately monitored nontouchably when measuring the temp. of this temp. detector 4.
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