| 摘要 |
PURPOSE:To accomplish measuring without using a measuring specimen platform by a method wherein a vacuum chamber is divided into a reaction room for surface treatment and measuring room for surface measurement and a manipulator travelling back and forth between the two rooms is provided capable of movement in a rectangular direction. CONSTITUTION:Air is drawn out of a measuring room 4 and reaction room 5, a gate valve 13 is opened, and a slide 18 is caused to move in the direction of the X-axis for the introduction of a wafer 1, installed on a fork 29 in the measuring room 4, into the reaction room 5 where the wafer 1 is placed on a specimen platform 6. After this, a reaction gas is allowed to flow through a valve 34 and a laser beam 31 is projected upon the wafer 1 for the formation of a film thereon. Upon completion of the reaction, the wafer 1 is returned to the measuring room 4 from the specimen platform 6. The wafer 1 is measured with ellipsometers 14 and 15 for identifying the physical features of the film formed thereon. The slider 18 is caused to move and rotate for the rotation of a shaft 23, which results in the movement of a slider 25 in the Z-direction. In this way, the wafer 1 is allowed to move along the X-direction, which enables the wafer 1 to travel on a plane without using a measuring stage.
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