发明名称 VACUUM PROCESSING DEVICE
摘要 PURPOSE:To reduce dust adhered on the surface of a matter to be processed and to improve the quality and the yield by a method wherein, when the matter to be processed is in a non-processing state, a cover is always placed on the matter to be processed. CONSTITUTION:A material W to be processed is processed in a vacuum or reduced pressure. At that time, a cover 6 is always placed on the matter W to be processed when the matter W to be processed is in a non-processing state. Such a metal as nickel and stainless steel is used as the material for the cover 6. Whereupon, as the cover 6 is always placed on the matter W to be processed at the initial time of exhaust and at the initial time of leak, the adhesion of dust to the surface of the matter W to be processed is remarkedly reduced. In this way, the quality and the yield are improved.
申请公布号 JPS62106628(A) 申请公布日期 1987.05.18
申请号 JP19850246657 申请日期 1985.11.01
申请人 FUJITSU LTD 发明人 KOBAYASHI KOICHI
分类号 C23C14/00;B01J3/00;H01L21/027;H01L21/203;H01L21/265;H01L21/30;H01L21/302;H01L21/3065 主分类号 C23C14/00
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