| 摘要 |
PURPOSE:To conduct exposure effectively through the simultaneous projection of a plurality of beams by forming an aperture, to which deflection electrodes are set up at every hole arranged in series, and a beam shielding aperture opposite to the holes to the deflection electrode side while being separated from said aperture. CONSTITUTION:The aperture 14 has the holes 13 disposed in series, conducting plates 15 are projected among the holes 13 along the direction of the charged beams, and deflection electrode pairs 16-17 are mutually insulated 26 at every hole to the same side and opposed. The conductive aperture 19 with the hole 18 of a narrow gap is arranged at a predetermined distance from the electrode 16- 17 side, and grounded together with the aperture 14. The charged beams 1 are molded by the holes 13 and projected onto a wafer 5, but shielded 15 at every the deflection electrode pair, and freely deflected separately. Accordingly, deflection voltage is selected and the beams are selectively projected to the aperture 19, the beams passing through the hole 18 are deflected in the arbitrary direction by the main and auxiliary deflection electrodes while the beams can be projected to a plurality of positions, the degree of freedom of the operation of exposure is increased, and the speed of production is also augmented. |
