RADIOPHOTOSENSITIVE POSITIVE TYPE PHOTORESIST COMPOSITION, PHOTOSENSITIVE MATERIAL AND MAKING OF PHOTORESIST,申请号JP19860254832-传众专利搜索

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发明名称	RADIOPHOTOSENSITIVE POSITIVE TYPE PHOTORESIST COMPOSITION, PHOTOSENSITIVE MATERIAL AND MAKING OF PHOTORESIST
摘要
申请公布号	JPS62105137(A)	申请公布日期	1987.05.15
申请号	JP19860254832	申请日期	1986.10.28
申请人	AMERICAN HOECHST CORP	发明人	DANA DAAHAMU
分类号	G03C1/72;G03F7/004;G03F7/022;H01L21/027	主分类号	G03C1/72
代理机构		代理人
主权项
地址

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