| 摘要 |
1. Organic solvent for stripping and cleaning film bases provided with cured or uncured resin-like positive-working or negative-working photoresist mixtures and for diluting said photoresist mixtures, characterized in that it is composed of a mixture of about 1 to 10 parts by weight of propylene glycol alkyl ether acetate and about 1 to 10 parts by weight of propylene glycol alkyl ether. |
