发明名称 |
Method of manufacturing a photoconductor element |
摘要 |
The invention relates to the manufacture of a photoconductor element. According to the invention, the ratio of the B2H6/SiH4 flow rates is adjusted in a reaction chamber 2 where there is a luminescent discharge between electrodes 9, 9' with a value sufficient for the product mu tau of the mobility mu of the electrons in the resulting photoconductor element times their lifetime tau to be equal to or less than 10<-8> cm<2>/V; and an amorphous silicon layer is formed on a substrate such as a drum 1. <IMAGE>
|
申请公布号 |
FR2590077(A1) |
申请公布日期 |
1987.05.15 |
申请号 |
FR19860015607 |
申请日期 |
1986.11.07 |
申请人 |
SHARP KK |
发明人 |
KAZUKI WAKITA, SYOICHI NAGATA, MASATSUGU NAKAMURA, KUNIO OHASHI, TADASHI TONEGAWA, KATSUHIRO NAGAYAMA ET YOSHIKO MURASATO |
分类号 |
H01L21/205;H01L31/09;H01L31/20;(IPC1-7):H01L21/205;H01L31/18 |
主分类号 |
H01L21/205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|