| 摘要 |
PURPOSE:To enable a phosphor screen of high quality to be formed by processing formed color phosphor layer with tannic acid. CONSTITUTION:A resist layer 5 is formed over the area of a phosphor screen other than a portion where a phosphor layer is to be formed, and phosphor slurry 6, which has been made by mixing phosphor of one color in a photosensi tive resin which will not be removed with the reversal agent of the resist layer 5, is applied thereto. Then, after the phosphor screen is exposed to light all over its surface from the outer surface of a panel 1, it undergoes developing process to form a phosphor layer 9 of one color. Then phosphor 10 on other portions and the resist layer 5 are removed by reversal development using a reversal agent to form a phosphor layer 9 of one color. Phosphor layer 9 of at least first one color after reversal development is treated with tannic acid to render wafer repellency. Through this treatment, a phosphor surface of high quality can be obtained.
|
