发明名称 SCANNING ELECTRON MICROSCOPE
摘要 PURPOSE:To automatically measure the size, such as fine pattern width and pitch of a sample displayed on an image display part by using a signal obtained by averaging signals of the periphery of a specified position in a size measurement direction and a vertical direction. CONSTITUTION:An electron beam 2 emitted by an electron beam 1 is converged thinnly through a condenser lens 3 and an objective 5 and focused on the sample 6. Further, the electron beam 2 is deflected in two dimensions by a deflecting coil which is operated with a control instruction from an electron computer 13 according to the signal of a deflection generator 9, thereby scanning on the sample 6. At this time, a signal such as a secondary electron 7 generated by the sample 6 is detected by a detector 8 and A/D-converted into a digital signal, which is D/A-converted while stored in an image memory 10, so that it is displayed on a CRT 14 as a brightness-modulated signal. Further, the number and interval of addition are settable for an area to be averaged and the width of an area displayed on the CRT 14 is varied according to them.
申请公布号 JPS62105006(A) 申请公布日期 1987.05.15
申请号 JP19850243987 申请日期 1985.11.01
申请人 HITACHI LTD 发明人 ARIMA JUNTARO
分类号 G01B15/00;H01J37/22;H01J37/28 主分类号 G01B15/00
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