发明名称 |
PHOTO-ASSISTED CVD |
摘要 |
A process and apparatus for depositing a film from a gas involves introducing the gas to a deposition environment containing a substrate, heating the substrate, and irradiating the gas with radiation having a preselected energy spectrum, such that a film is deposited onto the substrate. In a preferred embodiment, the energy spectrum of the radiation is below or approximately equal to that required to photochemically decompose the gas. In another embodiment, the gas is irradiated through a transparent member exposed at a first surface thereof to the deposition environment, and a flow of substantially inert gaseous material is passed along the first surface to minimize deposition thereon. |
申请公布号 |
DE3370832(D1) |
申请公布日期 |
1987.05.14 |
申请号 |
DE19833370832 |
申请日期 |
1983.05.09 |
申请人 |
ENERGY CONVERSION DEVICES, INC. |
发明人 |
ALLRED, DAVID;REYES, JAIME;WALTER, LEE;OVSHINSKY, STANFORD |
分类号 |
C23C16/04;C23C16/48;G03G5/08;(IPC1-7):C23C16/48 |
主分类号 |
C23C16/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|