发明名称 MONITORING METHOD FOR SETTING WAFER
摘要 PURPOSE:To accurately monitor by observing a composite image of two observing areas by optical detecting means having observing areas in a positional relation which is parallel to a reference of a wafer holder and is separated by the designing value of the interval of two marks. CONSTITUTION:A light beam (a) from a light source 10 is transmitted by half (b) at a half mirror 8 and reflected by half (c). The transmitted light (b) is fed through a mirror 7 and an enlarging lens system 5 to the observing area 4 of left side of a wafer 2. The light (e) reflected from the area 4 is fed to the observing surface 9 through the opposite route to the incident passage. The reflected light (c) of the mirror 8 is fed through an enlarging lens system 6 to the area 4, and the reflected light (h) is fed to the observing surface 9 through the reverse route. Accordingly, when two marks 3 are disposed at normal position separated by l in parallel with the reference line 1 of the wafer holder, the images of the marks 3 at the right and left entirely coincide on the observing surface 9.
申请公布号 JPS62102539(A) 申请公布日期 1987.05.13
申请号 JP19850242346 申请日期 1985.10.29
申请人 SUMITOMO ELECTRIC IND LTD 发明人 SUNAGO KATSUYOSHI
分类号 G05D3/12;G05D3/00;H01L21/67;H01L21/68 主分类号 G05D3/12
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